HORIBA's instruments can detect and analyse particles on photomask. For organic and polymer materials, RAMAN is used to analyze the detected foreign particles on a mask such as nylon, hair and cosmetic. For metal materials,XGT-9000 is used to analyze the detected foregin particles on a mask such as Ni, Al and Cr.
Ellipsometry is used to monitor thickness and optical constant (Réflective index (n) and Extinction Coefficient (k)) of pellicle on photomask.
Pellicle Thickness Analysis
Evaluates the thickness uniformity of the next generation pellicle.
Particle Object Identification
Useful for investgating problems by analyzing foreign matter components on the reticle.
Reticle / Mask Particle Detection System
Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm
In-situ spectroscopic ellipsometer for real-time thin film monitoring
Pulsed-RF Glow Discharge Optical Emission Spectrometer
AFM-Raman for Physical and Chemical imaging
Photoluminescence Microspectrometer
X-ray Analytical Microscope (Micro-XRF)
X-ray Analytical Microscope
with a Super Large Chamber
Add Spectroscopy to ANY Microscope
Cathodoluminescence Solutions for Electron Microscopy
Centrifugal Nanoparticle Analyzer
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