Providing Solutions At Every Stage Of The Semiconductor Manufacturing Process

Semiconductor Manufacturing Process

Providing Solutions At Every Stage Of The Semiconductor Manufacturing Process From Start To Finish

Semiconductors are the key evolving components in the industry today. HORIBA has kept its sights keenly focused on this micro world. Specialists in each field; We have pursued proprietary engineering projects in a wide range of areas that include evaluation and analysis, purity of ultra-pure water, composition of liquids and gases, and more broadly, environmental and safety. With our sights set clearly on the overall process, we have developed a line-up of analytical equipment, fluid control and measuring systems tailored to every stage of the semiconductor manufacturing process in response to stringent quality control requirements. In all stages, from materials evaluation through to final inspection, Our products help maintain high efficiency in the manufacture of leading-edge electronics devices.

The concentration of oxygen in silicon wafers has a significant impact on their electrical resistance. Therefore, it is crucial to control the concentration of oxygen, even in extremely small amounts, in silicon wafers. However, a challenge arises when analyzing highly doped single crystals. Due to their unique properties and high doping levels, the analysis of oxygen in these samples becomes more difficult. The presence of impurities and dopants can interfere with the accurate measurement of oxygen concentration using FT-IR spectroscopy.

In this application note, Raman spectroscopy is explored as an easier and more flexible technique for quantifying common components in a CMP slurry, such as benzotriazole and glycine, without any sample preparation or costly consumables.

Polysilicon, the raw material for silicon wafers, requires strict control of carbon content, which affects its conductivity. As higher purity silicon wafers are required, it is important to understand the amount of carbon contained in polysilicon supplied as a material. However, some carbon is present as carbonate and some is attached as CO2, making it very difficult to distinguish between them and analyze the extremely small amount of carbon.

TERS Characterization of Graphene Nanoribbons

Graphene is foreseen for a handful of electronic and optoelectronic nano-devices. Making nano-devices out of graphene requires nanopatterning. Determining the quality of patterned graphene is essential and the detection of defects demands a sensitive chemical nano-characterization tool.

Semiconductor Manufacturing Process

Vapor concentration control of precursors provide substantial improvement in stabilizing MOCVD processes. By measuring a precursor partial pressure in a downstream line with a Non Dispersive Infrared (NDIR) technology and controlling its total pressure, a precursor concentration can be kept constant. This precursor concentration control is validated as a practical method against a temperature fluctuation of a cylinder bath and a failure of reaching a saturation pressure in a cylinder.

Semiconductor pattern - XGT-9000

The combination of microbeam and thickness measurement capability makes the XGT-9000 a useful tool for the QC of semiconductors, which feature thin and narrow patterns. Thickness sensitivity depends on elements traced, but can be at the Angstrom level.

Semiconductor Manufacturing Process

The MOCVD process is a recognized controllable synthesis method that uses a variety of precursors like Trimethyl Indium (TMI) and Diethyl Zinc (DEZ) that require a robust delivery method to ensure process repeatability and high yield.

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